Compuware OptimalJ Takes Power of Patterns to a New Level

FARMINGTON HILLS, Mich. -- June 10, 2002 -- Compuware Corporation (Nasdaq: CPWR) today announced the commercial availability of OptimalJ 2.1, a Java development environment that’s at the forefront of pattern-editing functionality. Patterns facilitate reuse, leveraging pre-defined designs, structure and code, and capture the specific knowledge of the few skilled Java architects within an organization. OptimalJ’s pattern editing functionality enables software architects to build and maintain their own patterns to automatically implement working J2EE applications.

Patterns result in fast, efficient, standard development throughout the development process—focusing developers on what to build rather than how to build it. OptimalJ 2.1 gives architects a mechanism to define J2EE patterns that developers automatically use when building applications. Developers that use OptimalJ no longer need to exert time and effort on complex, technical infrastructures.

According to Tyler McDaniel, Director Application Strategies, Hurwitz Group, "Patterns help developers jump-start their development projects because the patterns contain technical architecture knowledge, which developers can then use and add business logic to. This significantly accelerates the development process because it makes the developer’s task a lot easier. OptimalJ 2.1 empowers organizations to build their own patterns rather then relying on pre-existing patterns."

"Developer productivity can be improved by using tools that make it easier for developers to learn how to work with and be more productive using J2EE," said Rikki Kirzner, Research Director at IDC. "The ability to develop specific patterns containing specialized knowledge that can be reused throughout the company, goes a long way towards helping architects create and maintain an individual architectural style. Developers can then focus on what needs to be built rather than on how it should be built."

The pattern editor extends OptimalJ with user-defined implementation patterns. Implementation patterns translate OptimalJ’s application models into physical code. Within OptimalJ, implementation patterns are expressed in the Template Pattern Language. To be able to develop patterns, OptimalJ 2.1 makes a repository available—allowing organizations to define their own patterns. Once architects understand the J2EE architecture, it is easy for them to build their own patterns from scratch using OptimalJ, as well as modify existing patterns.

Using domain patterns, also introduced in OptimalJ 2.1, domain models for new applications can be constructed more quickly, while reducing errors in the modeling phase. A library of domain patterns can also be started and maintained. In addition, OptimalJ 2.1 includes three new diagrams at the application model level, which greatly improve understanding of the application generated by OptimalJ, allowing developers to quickly navigate through the application components. The three new diagrams are: the DBMS Relational Diagram, the EJB Component Diagram and the Web Component Diagram. Finally, presentation model extensions are included, which allow developers to define the format and layout of attributes in the application model. This ensures faster development and maintenance through component reuse and increased consistency.

When speaking about OptimalJ, Jonathan Stephenson, Associate Analyst CBDi Forum explains, "The aim in version 2.0 was to lower the entry requirements for developers wanting to build powerful enterprise web applications for J2EE. In 2.1 we believe the power of patterns has been taken to a new level. Pattern-driven design for domain models is a laudable enough goal; pattern-driven transformation of domain models into applications is the capability that takes OptimalJ to a higher plain."

"Combining patterns and models is the key to boosting developer productivity and reducing the complexity of the J2EE platform. Models reduce business-process complexity, and patterns reduce technology complexity. Using patterns to automatically transform models into a J2EE architecture and subsequently into correct Java code greatly decreases development costs and improves application quality," said Edwin Schumacher, Director of Product Management for Compuware OptimalJ.

OptimalJ Pricing and Availability

OptimalJ 2.1 Professional Edition is available immediately. Licenses start at $4,995 per named developer. A 14-day trial version is also available.

Compuware Corporation

Compuware Corporation, a multi-billion dollar company, provides business value through software and professional services that optimize productivity and reduce costs across the application life cycle. Meeting the rapidly changing needs of businesses of all sizes, Compuware’s market-leading solutions improve the quality, ease the integration and enhance the performance of distributed, e-business and enterprise software. For more information about Compuware, please contact the corporate offices at 800-521-9353. You may also visit Compuware on the World Wide Web at http://www.compuware.com.